SOLICITATION NOTICE
99 -- MICRO-FABRICATION OF A MICRO-ELECTRO-MECHANICAL SYSTEM
- Notice Date
- 8/25/2008
- Notice Type
- Presolicitation
- NAICS
- 334413
— Semiconductor and Related Device Manufacturing
- Contracting Office
- NASA/Ames Research Center, JA:M/S 241-1, Moffett Field, CA 94035-1000
- ZIP Code
- 94035-1000
- Solicitation Number
- NNA08255468Q-RAJ
- Response Due
- 9/8/2008
- Archive Date
- 8/25/2009
- Point of Contact
- Rachel A. Jandron, Contract Specialist, Phone 650-604-2655, Fax 650-604-0912, - Veronica Llamas, Contracting Officer, Phone 650-604-5626, Fax 650-604-0932, />
- E-Mail Address
-
rachel.a.jandron@nasa.gov, veronica.llamas-1@nasa.gov<br
- Small Business Set-Aside
- N/A
- Description
- NASA/ARC has a requirement for custom micro-fabrication of aMicro-Electro-Mechanical System (MEMS) field emission electron gun for aminiature-scanning electronic microscope (m-SEM). Since the design optimization of them-SEM is an interactive process, the ideal supplier will have knowledge of previousfabrication steps as well as provide consultation for the design of the field emissionelectron gun.NASA/ARC intends to purchase the items from Applied NanoStructures, Inc 1700 Wyatt Dr.Ste 5, Santa Clara, CA, 95054-1526.The vendor must provide:I. MATERIALS High-quality silicon for fabrication of silicon cathode post structures and siliconnitride membrane frames for the electron gun anode. Nitrogen and silicon feedstock, such as ammonia and dichlorosilane, for nitridemembrane deposition. Silicon etchant, such as nitric acid and hydorflouric acid, for all silicon structures. Reactive ion etching (RIE) gas, such as sulfur hexafluoride, for silicon poststructures.II. MICRO-FABRICATION SERVICES Custom fabrication of individual silicon posts and matching nitride membranestructures. Custom fabrication of 55 silicon post arrays and matching nitride membrane arrays,including mask layout design and fabrication and processing. Wet etching for die separation and cathode and anode wall formation. RIE to fabricate silicon cathode posts. Nitridation for anode membranes.III. CONSULTATION Provide process parameters for fabrication of microstructures. Custom design recommendations to optimize structural integrity of the microstructures. Geometrical design recommendations (die size, cathode post height and diameter, nitridemembrane thickness) given knowledge of fabrication steps and an understanding of the goalfor the complete integrated structure of the electron optical column for the m-SEM. The Government intends to acquire a commercial item using FAR Part 12.Interested organizations may submit their capabilities and qualifications to perform theeffort in writing to Rachel Jandron at Rachel.A.Jandron@nasa.gov not later than 4:30 p.m.local time on September 8, 2008. Such capabilities/qualifications will be evaluatedsolely for the purpose of determining whether or not to conduct this procurement on acompetitive basis. A determination by the Government not to compete this proposed efforton a full and open competition basis, based upon responses to this notice, is solelywithin the discretion of the government.Oral communications are not acceptable in response to this notice.All responsible sources may submit an offer which shall be considered by the agency.An Ombudsman has been appointed. See NASA Specific Note "B".Any referenced notes may be viewed at the following URLs linked below.
- Web Link
-
FedBizOpps Complete View
(https://www.fbo.gov/?s=opportunity&mode=form&id=58109fcd9dc10263af715840e9fc7725&tab=core&_cview=1)
- Record
- SN01650300-W 20080827/080825222241-58109fcd9dc10263af715840e9fc7725 (fbodaily.com)
- Source
-
FedBizOpps Link to This Notice
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