MODIFICATION
36 -- Inductively Coupled Plasma/Plasma Enhanced Chemical Vapor Deposition Process Gas Delivery and Abatement System
- Notice Date
- 8/26/2005
- Notice Type
- Modification
- NAICS
- 325120
— Industrial Gas Manufacturing
- Contracting Office
- Department of the Navy, Office of Naval Research, Naval Research Laboratory, 4555 Overlook Ave. S.W., Washington, DC, 20375
- ZIP Code
- 20375
- Solicitation Number
- N00173-05-R-CR10
- Response Due
- 9/7/2005
- Archive Date
- 8/11/2006
- Small Business Set-Aside
- Total Small Business
- Description
- The purpose of this amendment is to address potential offeror?s questions. Question 1: To ensure that the abatement system is sized appropriately to handle the process gases listed in Table 2, should the offeror assume that the typical process gas flows for this application equal the Min Flow Rate (SCCM) stated in Table 2? Answer to Question 1: Yes. The abatement system must be configured to handle the minimum gas flows listed in Table 2. Question 2: In Section 7 it states, "The system is to be of passive dry chemical absorbance or gas reactor column design." Is NRL open to other effective abatement technologies for this application that will have a significantly lower Cost of Ownership compared to dry chemical absorbance abatement technology? Answer to Question 2: Yes. Question 3: Does the NRL facility have acid drain capabilities? Answer to Question 2: Yes. Question 4: How many chambers does the Oxford tool have? Answer to Question 4: There is one chamber in the Oxford PECVD system. Question 5: What is the substrate being used in the PECVD process? Is is Silicon? Is it Gallium Nitride? Answer to Question 5: A variety of substrates will be used in the multi-user PECVD system, including silicon, gallium nitride, gallium arsenide, diamond, and glass. Question 6: The minimum gas flows are indicated in the specification, but what are the process gas flows? Are they different from the minimum? Answer to Question 6: The gas flows are dependent on the process being implemented and the abatement equipment should be sized to handle the minimum flows listed in Table 2. Question 7: The gases are typically put into the tool using Mass Flow Controllers. What are the maximum flow rates of these controllers for the different gases being used in the process? Answer to Question 7: Vendors supplying gas abatement equipment are required only to meet the minimum flow requirements listed in Table 2. The values listed are actually the maximum mass flow controller ratings for the corresponding gas.
- Place of Performance
- Address: Naval Research Laboratory, 4555 Overlook Ave SW, Washington, DC
- Zip Code: 20375
- Zip Code: 20375
- Record
- SN00880952-W 20050828/050826213235 (fbodaily.com)
- Source
-
FedBizOpps.gov Link to This Notice
(may not be valid after Archive Date)
| FSG Index | This Issue's Index | Today's FBO Daily Index Page |