SOLICITATION NOTICE
66 -- SPUTTERING SYSTEM KIT
- Notice Date
- 3/6/2002
- Notice Type
- Solicitation Notice
- Contracting Office
- NASA/Glenn Research Center, 21000 Brookpark Road, Cleveland, OH 44135
- ZIP Code
- 44135
- Solicitation Number
- 3-193987
- Response Due
- 3/18/2002
- Archive Date
- 3/6/2003
- Point of Contact
- Nancy M. Shumaker, Purchasing Agent, Phone (216) 433-2133, Fax (216) 433-2480, Email Nancy.M.Shumaker@grc.nasa.gov
- E-Mail Address
-
Email your questions to Nancy M. Shumaker
(Nancy.M.Shumaker@grc.nasa.gov)
- Description
- This notice is a combined synopsis/solicitation for commercial items prepared in accordance with the format in FAR Subpart 12.6, as supplemented with additional information included in this notice. This announcement constitutes the only solicitation; quotes are being requested and a written solicitation will not be issued. This procurement is being conducted under the Simplified Acquisition Procedures (SAP). DESCRIPTION/SPECIFICATIONS: 1 EACH: Sputter Deposition Chamber and Source Overview: Contractor shall provide components of a system for reactive sputter deposition of silicon nitride onto 2 inch substrates with conformal coverage of mesa sidewalls. Components provided by contractor shall include: chamber with door and source shutter, rotary substrate holder with RF biasing capability, magnetron sputtering source, pneumatic gate valve. To produce a functional system, NASA will integrate the contractor supplied components with the following NASA owned components: turbopump, rotary vane pump, pulsed DC magnetron power supply, RF power supply and tuner for substrate bias, vacuum instrumentation, support frame. Detailed specifications: 1.Chamber. Chamber shall be fully UHV compatible, except for the door seal which shall be viton. All flanges shall be conflat compatible. Chamber shall have five ports with 8 inch flanges and one port with a 6 inch flange. Ports shall be configured in a right angle cross, except one of the side mounted 8 inch ports which shall be installed at a 30 degree angle from the horizontal. Chamber shall include mounting feet, a door with viewport on 8 inch flange, a pneumatic source shutter with UHV feedthrough on 1.33 inch flange, an 8 inch adapter flange with one 1.33 inch conflat port and two 2-3/4 inch conflat ports, an 8 inch adapter flange with one 2-3/4 inch conflat port. Four mounting feet shall be welded to bottom flange of chamber. Feet shall have 3/8 inch clearance holes at 8.52 inch x 10.37 inch to allow chamber to be bolted to an existing frame. Height of bottom flange from bottom of feet shall be in the range from 0 to 3 inch. Chamber shall have the following ports (a) 8 inch flange in front for door; (b) 8 inch flange on bottom for adapter to 2-3/4 inch flange; (c) 8 inch flange on top for gate valve; (d) 8 inch flange in back for adapter to one 1.33 and two 2-3/4 inch flanges (the feedthrough for the source shutter shall be mounted in the 1.33 inch port; the other two ports will be used for instrumentation); (e) 6 inch flange at side of chamber for horizontal mounting of sputter source; (f) 8 inch flange for a rotary substrate holder on the side opposite the sputter source; this port shall be installed at a 30 degree angle from horizontal such that the substrate surface is tipped downwards. 2.Rotary substrate holder: Shall use ferrofluidic feedthrough. Shall include motor and drive electronics for 5-20 rpm continuous rotation of substrate. Shall include rotary RF feedthrough and ground shield around substrate holder. Shall permit RF bias of substrate to 100 W or 150 V maximum. Shall include demountable substrate holder with clips for mounting of one 2 inch diameter wafer. The center of the substrate shall intersect the central axis of the sputter source. Target to substrate distance shall be 3 inches measured along the central axis of the sputter source. The substrate shall be oriented such that the angle of incidence for deposition is 30 degrees from perpendicular to provide good coverage of mesa sidewalls. The substrate surface shall be tipped downwards to minimize particulate accumulation 3.Magnetron sputter source: A Torus 3 inch UHV sputter source, manufactured by the Kurt Lesker Company, is required in order to provide for interchangeability of sources with a NASA owned Lesker CMS-18 sputtering system. The source shall be fully metal sealed to atmosphere. The source shall be mounted on a 6 inch conflat flange and shall have a 9 inch insertion length. The source shall accommodate 3 inch diameter targets with thicknesses of 0.125 and .250 inches. The source shall include a port for injection of gas at target. The position of the magnets shall be externally adjustable. 4.Pneumatic gate valve: Shall be metal sealed to atmosphere. Shall have 8 inch conflat flanges. Shall have viton seat. The provisions and clauses in the RFQ are those in effect through FAC 97-27. This procurement is a total small business set-aside. The NAICS Code and the small business size standard for this procurement are 339111 and 500, respectively. The quoter shall state in their quotation their size status for this procurement. All qualified responsible business sources may submit a quotation which shall be considered by the agency. Delivery shall be FOB Destination. The DPAS rating for this procurement is DO-C9. Quotations for the items described above are due by COB 03-18-02 and may be faxed to NASA-Glenn Research Center, Attn: Nancy Shumaker, and include, solicitation number, FOB destination to this Center, proposed delivery schedule, discount/payment terms, warranty duration (if applicable), taxpayer identification number (TIN), identification of any special commercial terms, and be signed by an authorized company representative. If the end products quoted are other than domestic end products as defined in the clause entitled "Buy American Act -- Supplies," the quoter shall so state and shall list the country of origin. The Representations and Certifications required by FAR 52.2l2-3 may be obtained via the internet at URL: http://ec.msfc.nasa.gov/msfc/pub/reps_certs/sats/ The FAR may be obtained via the Internet at URL: http://www.arnet.gov/far/ The NFS may be obtained via the Internet at URL: http://www.hq.nasa.gov/office/procurement/regs/nfstoc.htm Award will be based upon overall best value to the Government, with consideration given to the factors of proposed technical merits, price and past performance; other critical requirements (i.e., delivery) if so stated in the RFQ will also be considered. Unless otherwise stated in the solicitation, for selection purposes, technical, price and past performance are essentially equal in importance. It is critical that offerors provide adequate detail to allow evaluation of their offer (see FAR 52.212-1(b). Quoters must provide copies of the provision at 52.212-3, Offeror Representation and Certifications - Commercial Items with their quote. See above for where to obtain copies of the form via the Internet. An ombudsman has been appointed - See NASA Specific Note "B". It is the quoter's responsibility to monitor the following Internet site for the release of amendments (if any): http://nais.msfc.nasa.gov/cgi-bin/EPS/bizops.cgi?gr=C&pin=22 Potential quoters will be responsible for downloading their own copy of this combination synopsis/solicitation and amendments (if any).
- Web Link
-
Click here for the latest information about this notice
(http://nais.msfc.nasa.gov/cgi-bin/EPS/bizops.cgi?gr=D&pin=22#100370)
- Record
- SN00037230-W 20020308/020307125045 (fbodaily.com)
- Source
-
FedBizOpps.gov Link to This Notice
(may not be valid after Archive Date)
| FSG Index | This Issue's Index | Today's FBO Daily Index Page |